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Facilities
Nano-device Fabrication
Material Preparation
Device Characterizations
Material Preparation
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Material Preparation
2020-08-03
1.Single target RF sputtering
2020-08-03
2.Electron beam evaporation coating instrument
2020-08-03
3.Thermal resistance evaporation coating instrument
2020-08-03
4.Atomic Layer Deposition System (ALD)
2020-08-03
5.Chemical vapor deposition (CVD)
2020-08-03
6.Metal-Organic Chemical Vapor deposition (MOCVD)
2020-08-03
7.Pulsed Layer Deposition (PLD)
2020-08-03
8.Metal organic evaporator
2020-08-03
9.Magnetron Sputtering
Total 9 pieces
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