5.Chemical vapor deposition (CVD)-School of Microelectronics,Shandong University

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5.Chemical vapor deposition (CVD)

Date:2020-08-03Click:

1．Equipment name：CVD

Model and specification：OTF-1200X

Manufacturer：Hefei Kejing

2．Main technical parameters

● Temperature range：RT-1200 °C；● 3 gases

● Vacuum degree：10^-3Torr；● Diameter：50 cm

Prev: 4.Atomic Layer Deposition System (ALD)

Next: 6.Metal-Organic Chemical Vapor deposition (MOCVD)

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Postcode: 250101

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