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2.Laser Direct Writing System

Date:2020-08-03Click:

1. Instrument Name: Laser Direct Writing System

Model: MicroWriter ML®2; Manufacturer: DMO, UK

2. The main function of the instrument

The Microwriter ML II maskless laser direct writing system is a multifunctional laser direct writing lithography system specially developed for scientific research. It has not only the flexibility of a maskless direct writing system, but also the features of high writing speed, high resolution and low-cost. The integrated design and fully automatic control make Microwriter ML II with high reliability and easy operation. It is an ideal tool to replace traditional photolithography in microelectronics and semiconductor research.

3. Main Specifications

Maximum processing area: 200 mm in diameter;

Wide exposure mode, including two exposure bands of 405 nm and 375 nm

Maximum laser resolution: 0.6 µm; Auto focus accuracy: 100 nm

Recognizable file format: DXF, CIF, GDSII, Gerber.

4. Sample requirements (if any)

Sample size: 5 mm*5 mm-50 mm*50 mm