1. Instrument name: UV Exposure System

Model: MBJ4; Manufacturer: SUSS

2. The main function of the instrument

Photoresist UV exposure and overprint exposure, MJB4 is equipped with a highly reliable and high-precision alignment system, as well as sub-micron level high-resolution image transfer capabilities.

3. Main Specifications

(1) Two types of ultraviolet light sources: 365 nm (~ 14 mW/cm²), 405 nm (~ 15 mW/cm²).

(2) Four contact modes: Soft contact, Hard contact, Vacuum contact, Low vacuum contact.

(3) Mask Holder is compatible with 3–5 inch lithography plates.

1. Instrument name: Lithography Machine System (including Spin Coater and Dryer)

Model: H94-25C

Manufacturer: Sichuan Nanguang

2. The main function of the instrument

Photolithography in the manufacturing process of semiconductor devices.

3. Main Specifications

The minimum resolution in hard contact mode is up to 3 µm.

Sample size:＜2 inches